Preparation and Foliar Application of Oligochitosan - Nanosilica on the Enhancement of Soybean Seed Yield

DOI: 10.22161/ijeab/2.1.53

Abstract:
Oligochitosan with weight average molecu-lar weight (Mw) of 5000 g/mol was prepared by gamma Co-60 radiation degradation of 4% chitosan solution containing 0.5% H2O2 at 21 kGy. Nanosilica with size of 10 – 30 nm was synthesized by calcination of acid treated rice husk at 700o C for 2 h. The mixture of 2% oligo-chitosan-2% nanosilica was prepared by dispersion of nanosilica in oligochitosan solution. Oligochitosan, nanosilica and their mixture were characterized by gel permeation chromatography (GPC), transmission electr-on microscopy (TEM), X-ray diffraction (XRD), energy dispersive x-ray spectroscopy (EDX), Ultraviolet-visible spectroscopy (UV-Vis), and Furrier transform infrared spectroscopy (FT-IR). Effect of foliar application of oli-gochitosan and oligochitosan-nanosilica on soybean seed yield was conducted in experimental field. Results indi-cated that soybean seed yield increased 10.5 and 17.0% for oligochitosan and oligochitosan-nanosilica, respect-tively for the control. Radiation degraded oligo-chitosan and its mixture with nanosilica can be potentially used for cultivation of soybean with enhanced seed yield.

Keywords:
Oligochitosan, nanosilica, foliar, soybean, seed yield.

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